000 01108pam a2200313 a 4500
001 2927725
003 BD-DhUL
005 20150519135913.0
008 890714s1989 enka b 001 0 eng
010 _a 89037837
020 _a0852741286
040 _aDLC
_cDLC
_dDLC
_dBD-DhUL
050 0 0 _aQC166
_b.C443 1989
082 0 0 _a621.55
_223
_bCHB
100 1 _aChambers, A.
245 1 0 _aBasic vacuum technology /
_cA. Chambers, R.K. Fitch and B.S. Halliday.
260 _aNew York :
_bInstitute of Physics,
_cc1989.
300 _avii, 166 p. :
_bill. ;
_c26 cm.
365 _aUSD
_b29.10
500 _a"Printed with corrections 1995"--T.p. verso.
504 _aIncludes bibliographical references (p. [153]-155) and index.
650 0 _aVacuum.
650 0 _aVacuum technology.
700 1 _aFitch, R. K.
700 1 _aHalliday, B. S.
856 4 2 _3Publisher description
_uhttp://www.loc.gov/catdir/enhancements/fy0745/89037837-d.html
942 _2ddc
_cBK
955 _apc03 to bg00 07-14-89; bg06 to SCD 07-14-89; fg08 07-17-89; fr26 07-20-89; bk. rec'd jd00 03-13-97; CIP ver. jd25 04-03-97;
999 _c30804
_d30804