01606cam a2200397 a 4500001000700000003000800007005001700015008004100032010001700073020002500090035001900115035002300134035002700157035001600184040002100200050002300221082001800244090002300262245020400285260003900489300003500528490006100563500007600624504005300700650004900753650003200802700001800834700002100852700002300873710006300896830006200959900000901021942001201030999001701042952014901059378642BD-DhUL20150117150410.0850815s1983    nyua     b    101 0 eng    a   83008028   a0444007822 :c$73.00  a(OCoLC)9440983  a(OCoLC)ocm09440983  a(CStRLIN)NYCG85-B80888  a(NNC)378642  aBD-DhULcBD-DhUL0 aTA1673b.L355 19830 a621.3815bOSL  aTA1673b.L355 198300aLaser diagnostics and photochemical processing for semiconductor devices :bsymposium held November 1982 in Boston, Massachusetts, U.S.A. /ceditors, R.M. Osgood, S.R.J. Brueck, and H.R. Schlossberg.  aNew York :bNorth-Holland,cc1983.  axiii, 298 p. :bill. ;c24 cm.1 aMaterials Research Society symposia proceedings ;vv. 17  a"Sponsored by the Air Force Office of Scientific Research"--T.p. verso.  aIncludes bibliographical references and indexes. 0aLasersxIndustrial applicationsvCongresses. 0aSemiconductorsvCongresses.1 aOsgood, R. M.1 aBrueck, S. R. J.1 aSchlossberg, H. R.1 aUnited States.bAir Force.bOffice of Scientific Research. 0aMaterials Research Society symposia proceedings ;vv. 17.  aAUTH  2ddccBK  c32115d32115  00102ddc406621_381500000000000_OSL708NFIC960467aDUSLbDUSLcGENd2015-01-17ePurchasedo621.3815 OSLpA278293r2015-01-17w2015-01-17yBK