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  xmlns:dcterms="http://purl.org/dc/terms/"><dc:Title>Chemistry and lithography / Uzodinma Okoroanyanwu.</dc:Title>
<dc:Creator>Okoroanyanwu, Uzodinma.</dc:Creator>
<dc:Creator>Society of Photo-optical Instrumentation Engineers.</dc:Creator>
<dc:Subject>Lithography.</dc:Subject>
<dc:Subject>Chemistry, Technical.</dc:Subject>
<dc:Subject>Semiconductors Etching.</dc:Subject>
<dc:Subject>TP156.E68 O44 2010</dc:Subject>
<dc:Subject>621.381531 22 OKC</dc:Subject>
<dc:Description>Includes bibliographical references and index.</dc:Description>
<dc:Publisher>Hoboken, N.J. : Wiley ; Bellingham, Wash., USA : SPIE Press,</dc:Publisher>
<dc:Date>c2010.</dc:Date>
<dc:Date>c2010.</dc:Date>
<dc:Date>2010</dc:Date>
<dc:Type>Text</dc:Type>
<dc:Format>xxix, 861 p. :</dc:Format>
<dc:Language>eng</dc:Language>

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