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  <titleInfo>
    <title>Atomic layer deposition : principles, characteristics, and nanotechnology applications</title>
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  <name type="personal">
    <namePart>Kääriäinen, Tommi.</namePart>
    <role>
      <roleTerm authority="marcrelator" type="text">creator</roleTerm>
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  <name type="personal">
    <namePart>Cameron, David</namePart>
    <namePart type="date">1949-</namePart>
  </name>
  <name type="personal">
    <namePart>Kääriäinen, Marja-Leena.</namePart>
  </name>
  <name type="personal">
    <namePart>Sherman, Arthur</namePart>
    <namePart type="date">1931-</namePart>
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  <genre authority="marc">bibliography</genre>
  <genre authority="">Electronic books.</genre>
  <genre authority="local">Electronic books.</genre>
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    <dateIssued encoding="marc">2013</dateIssued>
    <edition>2nd edition.</edition>
    <issuance>monographic</issuance>
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  <note type="statement of responsibility">Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman.</note>
  <note>Includes bibliographical references and index.</note>
  <subject authority="lcsh">
    <topic>Chemical vapor deposition</topic>
  </subject>
  <subject authority="lcsh">
    <topic>Epitaxy</topic>
  </subject>
  <subject authority="lcsh">
    <topic>Microelectronics</topic>
  </subject>
  <subject authority="lcsh">
    <topic>Nanotechnology</topic>
  </subject>
  <subject authority="bisacsh">
    <topic>SCIENCE</topic>
    <topic>Nanoscience</topic>
  </subject>
  <subject authority="bisacsh">
    <topic>TECHNOLOGY &amp; ENGINEERING</topic>
    <topic>Nanotechnology &amp; MEMS</topic>
  </subject>
  <subject authority="fast">
    <topic>Chemical vapor deposition</topic>
  </subject>
  <subject authority="fast">
    <topic>Epitaxy</topic>
  </subject>
  <subject authority="fast">
    <topic>Microelectronics</topic>
  </subject>
  <subject authority="fast">
    <topic>Nanotechnology</topic>
  </subject>
  <subject authority="gnd">
    <topic>Nanotechnologie</topic>
  </subject>
  <subject authority="gnd">
    <topic>Atomlagenabscheidung</topic>
  </subject>
  <subject authority="sao">
    <topic>Mikroelektromekaniska system</topic>
  </subject>
  <classification authority="lcc">TS695</classification>
  <classification authority="ddc" edition="23">620/.5</classification>
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    <titleInfo>
      <title>Atomic layer deposition</title>
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    <name>
      <namePart>Kääriäinen, Tommi.</namePart>
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    <originInfo>
      <publisher>Hoboken, New Jersey : John Wiley &amp; Sons, [2013]</publisher>
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  <identifier type="lccn">2013016681</identifier>
  <identifier type="uri">http://onlinelibrary.wiley.com/book/10.1002/9781118747407</identifier>
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    <recordCreationDate encoding="marc">130423</recordCreationDate>
    <recordChangeDate encoding="iso8601">20171106121240.0</recordChangeDate>
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