03220cam a2200829 i 4500 ocn841199237 OCoLC 20171106121240.0 m o d cr ||||||||||| 130423s2013 mau ob 001 0 eng 2013016681 9781118747384 (epub) 1118747380 (epub) 9781118747421 (pdf) 1118747429 (pdf) 9781118747346 (mobi) 1118747348 (mobi) 9781118747407 (electronic bk.) 1118747402 (electronic bk.) 9781299619128 (MyiLibrary) 1299619126 (MyiLibrary) 9781118062777 (cloth ; alk. paper) 1118062779 (cloth ; alk. paper) AU@ 000053297848 CHBIS 010026644 CHVBK 306237601 DKDLA 820120-katalog:000652718 GBVCP 790208075 NZ1 15340633 AU@ 000058064304 DEBBG BV043395788 (OCoLC)841199237 (OCoLC)961668112 (OCoLC)962576539 DLC eng rda pn DLC N$T DG1 IDEBK CUS E7B COO NOC B24X7 HEBIS OCLCF YDXCP OCLCQ S3O pcc MAIN TS695 SCI 050000 bisacsh TEC 027000 bisacsh 620/.5 23 Kääriäinen, Tommi. Atomic layer deposition : principles, characteristics, and nanotechnology applications / Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman. [electronic resource] 2nd edition. Salem, Massachusetts : Scrivener Publishing, LLC ; Hoboken, New Jersey : Wiley, [2013] 1 online resource. text txt rdacontent computer c rdamedia online resource cr rdacarrier Includes bibliographical references and index. Print version record and CIP data provided by publisher. Chemical vapor deposition. Epitaxy. Microelectronics. Nanotechnology. SCIENCE Nanoscience. bisacsh TECHNOLOGY & ENGINEERING Nanotechnology & MEMS. bisacsh Chemical vapor deposition. fast (OCoLC)fst00853229 Epitaxy. fast (OCoLC)fst00914372 Microelectronics. fast (OCoLC)fst01019757 Nanotechnology. fast (OCoLC)fst01032639 Nanotechnologie gnd (DE-588)4327470-5 Atomlagenabscheidung gnd (DE-588)7712127-2 Mikroelektromekaniska system. sao Electronic books. Electronic books. local Cameron, David, 1949- Kääriäinen, Marja-Leena. Sherman, Arthur, 1931- Print version: Kääriäinen, Tommi. Atomic layer deposition. Hoboken, New Jersey : John Wiley & Sons, [2013] 9781118062777 (DLC) 2013016209 http://onlinelibrary.wiley.com/book/10.1002/9781118747407 Wiley Online Library ddc BK 206680 206680