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  xmlns:dcterms="http://purl.org/dc/terms/"><dc:Title>Atomic layer deposition : principles, characteristics, and nanotechnology applications / Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman. [electronic resource]</dc:Title>
<dc:Creator>Kääriäinen, Tommi.</dc:Creator>
<dc:Creator>Cameron, David, 1949-</dc:Creator>
<dc:Creator>Kääriäinen, Marja-Leena.</dc:Creator>
<dc:Creator>Sherman, Arthur, 1931-</dc:Creator>
<dc:Subject>Chemical vapor deposition.</dc:Subject>
<dc:Subject>Epitaxy.</dc:Subject>
<dc:Subject>Microelectronics.</dc:Subject>
<dc:Subject>Nanotechnology.</dc:Subject>
<dc:Subject>TS695</dc:Subject>
<dc:Subject>620/.5 23</dc:Subject>
<dc:Description>Includes bibliographical references and index.</dc:Description>
<dc:Description>Print version record and CIP data provided by publisher.</dc:Description>
<dc:Date>2013</dc:Date>
<dc:Type>Text</dc:Type>
<dc:Format>1 online resource.</dc:Format>
<dc:Identifier>http://onlinelibrary.wiley.com/book/10.1002/9781118747407</dc:Identifier>
<dc:Language>eng</dc:Language>
<dc:Relation>Atomic layer deposition.</dc:Relation>
<dc:Relation>Atomic layer deposition.</dc:Relation>

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