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  <titleInfo>
    <title>Atomic layer deposition of nanostructured materials</title>
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  <name type="personal">
    <namePart>Pinna, Nicola.</namePart>
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  <name type="personal">
    <namePart>Knez, Mato.</namePart>
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    <publisher>Wiley-VCH</publisher>
    <publisher>John Wiley [distributor]</publisher>
    <dateIssued>2011</dateIssued>
    <issuance>monographic</issuance>
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  <tableOfContents>Front Matter -- Introduction to ALD. Theoretical Modeling of ALD Processes / Charles B Musgrave -- Step Coverage in ALD / Sovan Kumar Panda, Hyunjung Shin -- Precursors for ALD Processes / Matti Putkonen -- Sol₆Gel Chemistry and Atomic Layer Deposition / Guylhaine Clavel, Catherine Marichy, Nicola Pinna -- Molecular Layer Deposition of Hybrid Organic₆Inorganic Films / Steven M George, Byunghoon Yoon, Robert A Hall, Aziz I Abdulagatov, Zachary M Gibbs, Younghee Lee, Dragos Seghete, Byoung H Lee -- Low-Temperature Atomic Layer Deposition / Jens Meyer, Thomas Riedl -- Plasma Atomic Layer Deposition / Erwin Kessels, Harald Profijt, Stephen Potts, Richard van de Sanden -- Nanostructures by ALD. Atomic Layer Deposition for Microelectronic Applications / Cheol Seong Hwang -- Nanopatterning by Area-Selective Atomic Layer Deposition / Han-Bo-Ram Lee, Stacey F Bent -- Coatings on High Aspect Ratio Structures / Jeffrey W Elam -- Coatings of Nanoparticles and Nanowires / Hong Jin Fan, Kornelius Nielsch -- Atomic Layer Deposition on Soft Materials / Gregory N Parsons -- Application of ALD to Biomaterials and Biocompatible Coatings / Mato Knez -- Coating of Carbon Nanotubes / Catherine Marichy, Andrea Pucci, Marc-Georg Willinger, Nicola Pinna -- Inverse Opal Photonics / Davy P Gaillot, Christopher J Summers -- Nanolaminates / Adriana V Szeghalmi, Mato Knez -- Challenges in Atomic Layer Deposition / Markku Leskel̃ -- Index.</tableOfContents>
  <note type="statement of responsibility">edited by Nicola Pinna, Mato Knez.</note>
  <note>Includes bibliographical references and index.</note>
  <subject authority="lcsh">
    <topic>Chemical vapor deposition</topic>
  </subject>
  <subject authority="lcsh">
    <topic>Nanostructured materials</topic>
  </subject>
  <subject authority="bisacsh">
    <topic>TECHNOLOGY &amp; ENGINEERING</topic>
    <topic>Mechanical</topic>
  </subject>
  <subject authority="fast">
    <topic>Chemical vapor deposition</topic>
  </subject>
  <subject authority="fast">
    <topic>Nanostructured materials</topic>
  </subject>
  <classification authority="lcc">TS695 .A86 2011</classification>
  <classification authority="ddc" edition="22">621.38152</classification>
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