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  xmlns:dcterms="http://purl.org/dc/terms/"><dc:Title>Ion implantation, sputtering and their applications / by P. D. Townsend, J. C. Kelly, N. E. W. Hartley.</dc:Title>
<dc:Creator>Townsend, P. D. (Peter David)</dc:Creator>
<dc:Creator>Kelly, J. C. (John Clive), joint author.</dc:Creator>
<dc:Creator>Hartley, N. E. W., joint author.</dc:Creator>
<dc:Subject>Ion implantation.</dc:Subject>
<dc:Subject>Sputtering (Physics)</dc:Subject>
<dc:Subject>QC702.7.I55 T67</dc:Subject>
<dc:Subject>541.2 19 TOI</dc:Subject>
<dc:Description>Includes bibliographies and index.</dc:Description>
<dc:Publisher>London ; New York : Academic Press,</dc:Publisher>
<dc:Date>1976.</dc:Date>
<dc:Date>1976.</dc:Date>
<dc:Date>1976</dc:Date>
<dc:Type>Text</dc:Type>
<dc:Format>ix, 333 p. :</dc:Format>
<dc:Language>eng</dc:Language>

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