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  xmlns:dcterms="http://purl.org/dc/terms/"><dc:Title>Ion implantation / G. Dearnaley and others.</dc:Title>
<dc:Creator>Dearnaley, G. (Geoffrey)</dc:Creator>
<dc:Subject>Ion implantation.</dc:Subject>
<dc:Subject>TK7871.85 .I586</dc:Subject>
<dc:Subject>537.56 DEI</dc:Subject>
<dc:Description>Includes index.</dc:Description>
<dc:Publisher>Amsterdam, North-Holland Pub. Co.; New York, American Elsevier,</dc:Publisher>
<dc:Date>c1973.</dc:Date>
<dc:Date>c1973.</dc:Date>
<dc:Date>1973</dc:Date>
<dc:Type>Text</dc:Type>
<dc:Format>xv, 802 p. :</dc:Format>
<dc:Language>eng</dc:Language>
<dc:Relation>Defects in crystalline solids, v. 8</dc:Relation>

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