<?xml version="1.0" encoding="UTF-8"?>
<metadata
  xmlns="http://example.org/myapp/"
  xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance"
  xsi:schemaLocation="http://example.org/myapp/ http://example.org/myapp/schema.xsd"
  xmlns:dc="http://purl.org/dc/elements/1.1/"
  xmlns:dcterms="http://purl.org/dc/terms/"><dc:Title>Ion implantation in semiconductors, silicon and germanium [by] James W. Mayer, Lennart Eriksson and John A. Davies.</dc:Title>
<dc:Creator>Mayer, James W., 1930-</dc:Creator>
<dc:Creator>Eriksson, Lennart, 1938- joint author.</dc:Creator>
<dc:Creator>Davies, John Arthur, 1927- joint author.</dc:Creator>
<dc:Subject>Ion implantation.</dc:Subject>
<dc:Subject>Semiconductors.</dc:Subject>
<dc:Subject>TK7871.85 .M38</dc:Subject>
<dc:Subject>537.56 19 MAI</dc:Subject>
<dc:Description>Includes bibliographical references.</dc:Description>
<dc:Publisher>New York, Academic Press,</dc:Publisher>
<dc:Date>1970.</dc:Date>
<dc:Date>1970.</dc:Date>
<dc:Date>1970</dc:Date>
<dc:Type>Text</dc:Type>
<dc:Format>xiii, 280 p. :</dc:Format>
<dc:Language>eng</dc:Language>

</metadata>